MANUFACTURING METHOD FOR ELASTIC BOUNDARY WAVE DEVICE

摘要

Provided is a method for manufacturing an elastic boundary wave device, in which a discontinuous portion is hardly formed in a dielectric film thereby to deteriorate the electric characteristics hardly, although an IDT is not thinned so much, in case the dielectric film is formed by a deposition method. In the elastic boundary wave device manufacturing method, a lower dielectric film (5) is so formed over a piezoelectric substrate (1), after an IDT (4) was formed, as to cover the IDT (4). A flattening step is executed to reduce the corrugations of the upper face of the lower dielectric film (5). An upper dielectric film (7) is formed to cover the lower dielectric film (5) having the corrugation-reduced upper face.