Verfahren zur Regelung eines reaktiven Hochleistungs-Puls-Magnetronsputterprozesses und Vorrichtung hierzu
摘要
Method for regulating a reactive high performance pulsed sputtering process comprises changing the discharge performance as an adjusting parameter whilst the pulse frequency of the discharge is varied. An independent claim is also included for a device for reactive high performance pulsed sputtering.
申请公布号
DE102006061324(B4)
申请公布日期
2008.07.24
申请号
DE20061061324
申请日期
2006.12.22
申请人
FRAUNHOFER-GESELLSCHAFT ZUR FOERDERUNG DER ANGEWANDTEN FORSCHUNG E.V.