| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a polishing pad excellent in durability, good in self-dressability and also good in adhesivity between the polishing layer and the substrate layer. <P>SOLUTION: This polishing pad is equipped with a polishing layer on a substrate layer, where the polishing layer comprises a thermosetting polyurethane foam having nearly spherical open pores with 20-300 μm average pore diameter. The polyurethane foam contains an isocyanate component and an active hydrogen-containing compound as raw material components, where the active hydrogen-containing compound comprises a low molecular weight polyol with 3-8 functional groups and 400-1,830 mgKOH/g hydroxyl value and/or a low molecular weight polyamine with 3-8 functional groups and 400-1,870 mgKOH/g amine value, in an amount of 1-20 wt.%. <P>COPYRIGHT: (C)2008,JPO&INPIT |
