| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a conveyance tray capable of accurately and approximately uniformly controlling temperature of a substrate to be processed entirely over its surface, and a vacuum treatment apparatus. <P>SOLUTION: At least one recess 11 corresponding to an outline of the substrate S to be processed is formed on a substrate mounting surface of the conveyance tray 1, and an annular sealing means 2 along the outer periphery of the bottom of the recess and a pressurizing means 3 for pressing the outer peripheral surface of the substrate placed by dropping into the recess against the sealing means are provided. At least one gas passage 12a or 12b connecting with the recess is opened, and a cooling gas is supplied through the gas passage to a space defined on the rear of the substrate to be processed by being supported by the sealing means. <P>COPYRIGHT: (C)2008,JPO&INPIT</p> |
