| 摘要 |
PROBLEM TO BE SOLVED: To provide a yield calculating method of a semiconductor with which a systematic yield of the semiconductor device can be calculated more precisely. SOLUTION: The method is provided with a first step S6 selecting a first specified pattern and a second pattern different from the first pattern from a designed device pattern, a second step S8 obtaining probability that the second pattern passes in a test when the first specified pattern passes in the test in accordance with a distance between the first pattern and the second pattern by using a table value or a function which is previously obtained, and a third step S10 for obtaining the yield of the device pattern based on a product of a probability value that the second pattern passes in the test when the first pattern passes in the test and a yield value of the first pattern. COPYRIGHT: (C)2008,JPO&INPIT
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