发明名称 |
METHOD AND DEVICE OF INSPECTING SOLID-STATE IMAGING DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To provide the method of inspecting a semiconductor wafer by which a plurality of solid-state imaging devices formed on a semiconductor wafer can be optically and electrically inspected as a wafer at the same time. SOLUTION: A solid-state imaging device wafer 21 is sucked to a contactor 241 comprised of a contactor frame 181 and a sheet frame 221 by reducing pressure, so as to connect the external connection electrode 131 of each of the solid-state imaging devices 11 with the anisotropic conductive member 211 of the contactor 241. Light is given to the main side of the solid-state imaging device wafer 21 to inspect all solid-state imaging devices 11 as a wafer at the same time. COPYRIGHT: (C)2008,JPO&INPIT
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申请公布号 |
JP2008171905(A) |
申请公布日期 |
2008.07.24 |
申请号 |
JP20070001882 |
申请日期 |
2007.01.10 |
申请人 |
MATSUSHITA ELECTRIC IND CO LTD |
发明人 |
WAGA SATORU;TAKAYAMA YOSHIKI;NISHIO TETSUSHI;FUKUDA TOSHIYUKI;NAKADA YOSHIRO |
分类号 |
H01L21/66 |
主分类号 |
H01L21/66 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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