发明名称 Two-dimensional arrays of holes with sub-lithographic diameters formed by block copolymer self-assembly
摘要 Methods for fabricating sublithographic, nanoscale microstructures in two-dimensional square and rectangular arrays utilizing self-assembling block copolymers, and films and devices formed from these methods are provided.
申请公布号 US2008176767(A1) 申请公布日期 2008.07.24
申请号 US20070657273 申请日期 2007.01.24
申请人 MICRON TECHNOLOGY, INC. 发明人 MILLWARD DAN B.
分类号 C40B50/00;C40B40/14 主分类号 C40B50/00
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