摘要 |
<p>A photoactive compound, and a photosensitive composition containing the photoactive compound are provided to improve sensitivity, residual film rate, mechanical strength, heat resistance, chemical resistance and development resistance. A photoactive compound comprises an oxime ester group and a triazine group and is represented by the formula 1, wherein R is a C1-C6 alkyl group, a C1-C6 haloalkyl group, a C1-C6 alkyl group substituted with at least one selected from NL2, OL and SL, a phenyl group substituted or unsubstituted with at least one selected from a C1-C6 alkyl group, a halogen atom, a nitrile group, OH and COOH, or a C2-C5 alkyl carboxylic acid group; L is H or a C1-C6 alkyl group; R' is H, a C1-C6 alkyl group, a nitrile group, or a phenyl group; X is a single bond, CH2, C=O, O, S, S=O, SO2, NR'', or CH=CH; R'' is H, a C1-C6 alkyl group, or a C2-C6 alkyl carboxylic acid group; and Y and Y' are independently H, a halogen atom, CN, a C1-C6 alkyl group, a C1-C6 alkoxy group, or a C1-C6 alkylthio group.</p> |