| 摘要 |
<p>A resist composition is provided to improve the solubility during the preparation of a resist and the adhesion of a resist film during development and to enhance the stability of resist and safety. A resist composition comprises a resist component; and an organic solvent which comprises at least one organic solvent selected from a hydroxy polyvalent carboxylate compound group comprising a hydroxy polyvalent carboxylate compound containing a C2-C6 carboxylic acid part, an acetoxy carboxylate compound group comprising an acetoxy carboxylate compound containing a C2-C6 carboxylic acid part and an alkoxy carboxylate compound group comprising an alkoxy carboxylate compound containing a C2-C6 carboxylic acid part.</p> |
