发明名称 Measuring method and apparatus using attenuation in total reflection
摘要 A plurality of measuring units (10) each comprising a dielectric block, a metal film layer which is formed on a surface of the dielectric block and a sample holder are supported on a support. The support is moved by a support drive means (50) to bring in sequence the measuring units to a measuring portion comprising an optical system which projects a light beam (30) emitted from a light source (31), and a photodetector (40) which detects attenuation in total internal reflection by detecting the intensity of the light beam which is reflected in total internal reflection at the interface between the dielectric block and the metal film layer. In this measuring apparatus, lots of samples can be measured in a short time.
申请公布号 EP1947446(A2) 申请公布日期 2008.07.23
申请号 EP20080003503 申请日期 2001.03.14
申请人 FUJIFILM CORPORATION 发明人 NAYA, MASAYUKI;KUBO, TAKASHI;OGURA, NOBUHIKO;MORI, NOBUFUMI
分类号 G01N21/55 主分类号 G01N21/55
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