| 摘要 |
The present invention provides a method of cleaning a substrate surface (1a) from a crystal nucleus (11) in which the substrate surface (1a) is held in a condition under which a crystal growth is accelerated with respect to normal clean room and normal air conditions. In particular, light (3a) having a wavelength so as to induce a crystal (11a) growth is irradiated, and, additionally, at least one reactive gas (12) is fed at a higher concentration than under normal clean room and normal air conditions. After placing the substrate under these conditions, the grown crystals (11a) are removed, for example by rinsing with water. As a consequence, the crystal nucleus is removed from the substrate surface. |
