| 摘要 |
A photomask material, a photomask using the photomask material, and a method for preparing the photomask are provided to improve sensitivity, mechanical strength, hardness and solvent resistance. A photomask material comprises a transparent base; and a photosensitive transfer material which is laminated so as to allow its photosensitive side to face with the base, wherein the photosensitive transfer material is provided with a photosensitive layer which comprises an alkali-soluble resin binder having a polymerizable unsaturated bond, a monomer at least one polymerizable unsaturated bond, a photopolymerization initiator having the photosensitivity to the light having a wavelength of 405 nm or less, and a colorant whose surface is treated with a polymerizable dispersant. |
