| 摘要 |
A high efficient vertical furnace apparatus with one chamber and plural tubes are provided to simultaneously process a plurality of wafers in the same condition. A high efficient vertical furnace apparatus includes one processing chamber(1), a plurality of vertical processing tubes(2), a boat loading region(31), a robot type substrate loading tool(23), and a fluid supply device. The plurality of vertical processing tubes are associated with one processing chamber. The boat loading region receives at least two substrate processing boats(3,3'), and is engaged with the processing chamber. The robot type substrate loading tool conveys a plurality of substrates to one of the substrate processing boats. The fluid supply device selectively supplies fluid to at least one of the processing chamber, the boat region, and one of the vertical processing tubes.
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