| 摘要 |
PROBLEM TO BE SOLVED: To obtain a resin composition capable of forming an elaborate pattern when irradiated with a radiation by including a copolymer (A) comprising repeating units derived from a carboxyl-containing methacrylic monomer, repeating units derived from a methacrylate (A2) other than A1, repeating units derived from a radically polymerizable compound (A3), and other types of repeating units with a polyfunctional methacrylate (B) having a specified structure. SOLUTION: Component A is a copolymer comprising repeating units A1 represented by formula I (wherein R1 is ethylene or cyclohexylene; and n is 1-9), repeating units derived from A2, other than A1, being a methacrylate (e.g. methyl methacrylate), and repeating units derived from A3 being a radically polymerizable compound (e.g. ethyl acrylate). Component B is a polyfunctional methacrylate selected from compounds of formula II (wherein R2 is H, OH, a 1-4C alkyl, or a 1-4C hydroxyalkyl) and compounds of formula III [wherein R3 is (CH2CH2O)a, (CH2CH(CH3)O)b, a 2-6C alkylene, or the like; and a and b are each 1-9]. |
