发明名称 AMORPHOUS METAL FILM AND PROCESS FOR APPLYING SAME
摘要 <p>Ni-based refractory metallic glass coatings utilizing periodic table group five element vanadium in combination with other group 5 or 6 elements, particularly tantalum, chromium, or molybdenum, can be formed via co-sputtering with proper control of carrier gas pressure and/or bias voltage. The alloy forms fully amorphous coatings that are not predicted by the usual glass forming ability (GFA) criteria. These alloys exhibit high thermal stability, hardness values greater than TiN, smooth surface finishes, and a wide processing window.</p>
申请公布号 EP1945448(A2) 申请公布日期 2008.07.23
申请号 EP20060851874 申请日期 2006.09.08
申请人 BILELLO, JOHN C. 发明人 BILELLO, JOHN C.
分类号 B32B15/00;C22C45/10;C23C14/14;C23C14/35 主分类号 B32B15/00
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