发明名称 |
Method for forming a porous reaction injection molded chemical mechanical polishing pad |
摘要 |
The present invention provides a method of forming a chemical mechanical polishing pad comprising, providing a tank with polymeric materials, providing a storage silo with microspheres and providing an isocyanate storage tank with isocyanates. The invention further provides delivering the polymeric materials and the microspheres to a premix prep tank, forming a pre-mixture of the polymeric materials and the microspheres, delivering the pre-mixture to a premix run tank and forming a mixture of the pre-mixture and the isocyanates. Further the invention provides injecting the mixture into a closed mold, curing the polishing pad in the mold and degassing at least one of the tank, isocyanate storage tank and the mold. |
申请公布号 |
US7399437(B2) |
申请公布日期 |
2008.07.15 |
申请号 |
US20060398419 |
申请日期 |
2006.04.04 |
申请人 |
ROHM AND HAAS ELECTRONICS MATERIALS CMP HOLDINGS,INC. |
发明人 |
JAMES DAVID B.;ROBERTS JOHN V. H. |
分类号 |
B24D99/00;B29C44/06;B29D99/00 |
主分类号 |
B24D99/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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