Halogenated oxime derivatives and the use thereof

摘要

Compounds of the formula (I) or (II) wherein R₁ is C₁-C₁₀haloalkylsulfonyl, halobenzenesulfonyl, C₂- C₁₀haloalkanoyl, halobenzoyl; R₂ is halogen or C₁-C₁₀ haloalkyl; Arl is phenyl, biphenylyl, fluorenyl, naphthyl, anthracyl, phenanthryl, or heteroaryl, all of which are optionally substituted; Ar'₁ is for example phenylene, naphthylene, diphonylene, heteroarylene, oxydiphenylene, phenyleneD-D₁-D-phenylene or -Ar'₁-A₁-Y₁-A₁-Ar'₁-; wherein these radicals optionally are substituted; Ae', is phenylene, naphthylene, anthracylene, phenanthrylene, or heteroarylene, all optionally substituted; A, is for example a direct bond, -0-, -S-, or -NR₆-; Y, inter alia is C₁-C₁₈alkylene; X is halogen; D is for example -0-, -S- or -NR₆-; D, inter alia is C₁-C₁₈alkylene; are particularly suitable as photolatent acids in ArF resist technology.