发明名称 |
Apparatus for generating light in the extreme ultraviolet and use in a light source for extreme ultraviolet lithography |
摘要 |
The device comprises a device ( 2 ) for creating an essentially linear target ( 4 ) in an evacuated space where laser beams ( 1 ) are focused, the target being suitable for interacting with the focused laser beams ( 1 ) to emit a plasma emitting radiation in the extreme ultraviolet. A receiver device ( 3 ) receives the target ( 4 ) after it has interacted with the focused laser beams ( 1 ), and a collector device ( 110 ) collects the EUV radiation emitted by the target ( 4 ). The focusing elements ( 11 ) for focusing the laser beams on the target ( 4 ) are arranged in such a manner that the laser beams ( 1 ) are focused on the target ( 4 ) laterally, being situated in a common half-space relative to the target ( 4 ) and being inclined at a determined angle lying in the range about 60° to about 90° relative to a mean collection axis ( 6 ) perpendicular to the target ( 4 ). The collector device ( 110 ) is disposed symmetrically about the mean collection axis ( 6 ) in the half-space containing the laser beams ( 1 ) focused on the target ( 4 ) and inside a conical space ( 8 ) centered on the mean collection axis ( 6 ) with a vertex situated at the target ( 4 ) and a half-angle at the vertex that is less than the angle of inclination of the focused laser beams ( 1 ) relative to the mean collection axis ( 6 ). The device is suitable for use as a source for EUV radiation in lithography for fabricating integrated circuits.
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申请公布号 |
US7399981(B2) |
申请公布日期 |
2008.07.15 |
申请号 |
US20050151696 |
申请日期 |
2005.06.13 |
申请人 |
COMMISSARIAT ENERGIE ATOMIQUE;ALCATEL VACUUM TECHNOLOGY FRANCE |
发明人 |
CHEYMOL GUY;CORMONT PHILIPPE;THRO PIERRE-YVES;SUBLEMONTIER OLIVIER;SCHMIDT MARTIN;BARTHOD BENOIT |
分类号 |
H05G2/00;G03F7/20;H01S3/23 |
主分类号 |
H05G2/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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