| 摘要 |
Parts for improving ion implantation are provided to solve problems related to delamination of a deposited material by including a surface for confining at least a part of a path of an ion beam by an ion implanter. Parts of an ion implanter(10) has a surface for at least partially confining a path of an ion beam by the ion implanter wherein at least a part of the surface is roughened. A part of the surface can be roughened to provide a pattern of a surface feature. A part of the surface can be roughened to provide a series of grooves.
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