PATTERN FORMING PROCESS FOR SEMICONDUCTOR DEVICE

摘要

A method for forming patterns of semiconductor devices is provided to form effectively micro patterns by performing a rinse process on a photosensitive film pattern using liquids with a low surface tension. In a method for forming patterns of semiconductor devices to coat water-soluble materials on photosensitive film patterns, a surface of the photosensitive film patterns(115) is rinsed using a composition(120) having polymer and water before coating the water-soluble materials on the photosensitive film patterns. The composition includes compounds of 0.0001 to 5 weight percent and water of the rest of weight percent. The water-soluble materials are RELACS(Resolution Enhancement Lithography Assisted by Chemical Shrink) materials(117).