| 摘要 |
An exposure apparatus illustrated in Figure 16A has first and second movable stages (1630A, 1630B) and first to third stator coils (1710, 1720, 1730). The first movable stage (1630A) holds and aligns a first wafer at a predetermined position. The second movable stage (1630B) holds and aligns a second wafer at a predetermined position. The first stator coils (1710) are provided for driving one of said first and second movable stages in a first direction and are located in a measurement region (1670) for measuring an exposure result. The second stator coils (1720) are for driving the other of said first and second movable stages located in an exposure region (1680) for performing exposure in the first direction independently of said movable stage in the measurement region. The third stator coils (1730) are for independently driving said first and second movable stages in a second direction perpendicular to the first direction. A current control means (500) supplies control currents to said first to third stator coils. The control currents having phase differences to generate driving forces between movable element magnets of said first and second movable stages and said stator coils facing the movable element magnets. Also disclosed is an alignment apparatus which generates driving forces with six degrees of freedom between stator coils and movable clement magnets to implement high-accuracy position and posture control has movable element magnets (114) which are arrayed in a plate-like plane of the movable element in accordance with an array cycle and are magnetized in predetermined directions, stator coils (116) which are arrayed at intervals corresponding to the array cycle, and a current controller which supplies to each pair of adjacent ones of stator coils control currents having phase differences to generate driving forces for driving the movable element between the movable element magnets and stator coils facing the movable element magnets. |
