ETCHING APPARATUS USING NEUTRAL BEAM

摘要

An etching apparatus using neutral beam is provided to convert an ion beam into a neutral beam while having high neutralizing efficiency. An etching apparatus using neutral beam includes an ion extracting unit(12,18), an electron emission unit(13,13a,19), and a chuck(15). The ion extracting unit extracts an ion beam from plasma in a chamber(10). The ion extracting unit includes a plurality of grids and a first direct current power source part. The electron emission unit converts the extracted ion beam into a neutral beam by colliding electrons with the extracted ion beam. The electron emission unit includes an electron emission electrode, an electron emission layer, and a second direct current power source part. The chuck fixes and supports an etch target etched by the neutral beam.