Exposure apparatus and exposure method

摘要

An exposure apparatus for performing direct exposure on a relatively moving exposure target substrate comprises: a plurality of exposure heads arranged so that an overlapping exposed area occurs between exposed areas formed on the exposure target substrate as a result of exposure by the exposure heads; and light adjusting means for adjusting the amount of light to be projected from two adjacent exposure heads onto the overlapping exposed area so that the amount of the projected light becomes equal to the amount of light that a single exposure head would project onto an exposure area if the exposure area were to be exposed through the same pattern by the single exposure head alone.