Method of fabricating a semiconductor device having fine contact hole,申请号KR20070032826-传众专利搜索

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发明名称	Method of fabricating a semiconductor device having fine contact hole
摘要
申请公布号	KR100843713(B1)	申请公布日期	2008.07.04
申请号	KR20070032826	申请日期	2007.04.03
申请人		发明人
分类号	H01L21/28	主分类号	H01L21/28
代理机构		代理人
主权项
地址

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