发明名称 |
Side lobe image searching method in lithography |
摘要 |
A method for detecting the presence of side lobes in a full chip layout having a main pattern designed on a mask includes surrounding the main pattern with a pattern of polygons or circles. A lithography rule check is performed and uses the pattern of polygons or circles to search the main pattern for side lobes. The location of a side lobe is preferably marked with an error flag.
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申请公布号 |
US2008163154(A1) |
申请公布日期 |
2008.07.03 |
申请号 |
US20060647068 |
申请日期 |
2006.12.28 |
申请人 |
MACRONIX INTERNATIONAL CO., LTD. |
发明人 |
WU TZONG-HSIEN |
分类号 |
G06F17/50 |
主分类号 |
G06F17/50 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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