发明名称 |
Cleaning liquid, cleaning method, liquid generating apparatus, exposure apparatus, and device fabricating method |
摘要 |
An exposure apparatus exposes a substrate through an exposure liquid with exposure light. A cleaning liquid is provided to the exposure apparatus, in order to clean at least part of the exposure apparatus. In the clearing liquid, a prescribed gas of an amount that is greater than or equal to the saturation concentration is dissolved.
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申请公布号 |
US2008156356(A1) |
申请公布日期 |
2008.07.03 |
申请号 |
US20070987633 |
申请日期 |
2007.12.03 |
申请人 |
NIKON CORPORATION;KURITA WATER INDUSTRIES, LTD. |
发明人 |
NAGASAKA HIROYUKI;MORITA HIROSHI;TOKOSHIMA HIROTO |
分类号 |
B08B13/00;C11D10/00;G03B27/52 |
主分类号 |
B08B13/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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