| 摘要 |
<p>A method and an apparatus for preventing closing of an exhaust line in a semiconductor manufacturing device are provided to prevent process errors caused by fume remaining inside a process chamber by vaporizing a liquid such as moisture and solvent into a gas. An apparatus for preventing closing of an exhaust line in a semiconductor manufacturing device comprises an exhaust line(24) and a fuzzy device(26). The exhaust line exhausts an agent and moisture generated in a main body(20) of a chamber during a baking process. The fuzzy device is installed on the exhaust line, and vaporizes the liquid generated in the main body of the chamber into a gas when performing a baking process. Wherein, the liquid is an agent and moisture.</p> |
