| 发明名称 |
APPARATUS AND METHOD FOR REDUCING DEFECTS |
| 摘要 |
An embodiment relates generally to an apparatus for reducing defects. The apparatus includes a spindle adapted to hold a wafer; and at least two light sources configured to direct light to a top-side and a back-side of the wafer
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| 申请公布号 |
US2008160457(A1) |
申请公布日期 |
2008.07.03 |
| 申请号 |
US20060617243 |
申请日期 |
2006.12.28 |
| 申请人 |
COLLINS SEAN MICHAEL;HALL DAVID C;JESSEN SCOTT W |
发明人 |
COLLINS SEAN MICHAEL;HALL DAVID C.;JESSEN SCOTT W. |
| 分类号 |
G03B27/68;G03F7/20 |
主分类号 |
G03B27/68 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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