| 摘要 |
<p>An exposure system and an exposure method are provided to prevent exposure defects due to an alignment defect by measuring and compensating the bending of a yaw guide. A substrate is placed on a stage(120). A moving unit moves the stage. A yaw guide(130) guides the stage. A measuring unit measures the deviation of the stage. A control unit detects the bending of the yaw guide on the basis of a deviation angle of the stage measured by the measuring unit. The control unit compensates movement of the stage on the basis of the detected bending. The moving unit comprises an X-stage and a Y-stage. The X-stage moves the stage in an X direction. The Y-stage moves the stage in a Y direction. The measuring unit includes a bar mirror(122) and plural theta laser interferometers(144,145). The bar mirror is formed on the stage. The theta laser interferometers are formed on the outside of the stage to irradiate a laser to the bar mirror.</p> |
