| 摘要 |
Provided is a method for fabricating an image sensor. In the method, a low temperature oxide layer is formed on a color filter layer, and a photoresist pattern is formed on the low temperature oxide layer. Subsequently, a heat treatment is performed on the photoresist pattern to form sacrificial microlenses. The sacrificial microlenses and the low temperature oxide layer are etched to form preliminary microlenses formed the low temperature oxide layer. The preliminary microlenses are etched to form microlenses having a reduced curvature radius in comparison with that of the preliminary microlenses.
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