Semiconductor device and method for fabricating the same

摘要

A semiconductor device has a MIM capacitor including a first insulating film formed on a semiconductor substrate, a lower electrode composed of a first metal film formed on the first insulating film, a capacitor insulating film formed on the lower electrode, and an upper electrode composed of a second metal film formed on the capacitor insulating film. The semiconductor device further has a lower interconnect composed of the first metal film formed on the first insulating film and an upper interconnect composed of the second metal film formed on the lower interconnect. The upper interconnect and the upper electrode are formed integrally.