VERFAHREN ZUR VERBESSERUNG VON PHASENVERSCHIEBUNGSMASKEN MIT GRENZREGIONEN IN DER NÄHE VON PHASE 0- UND PHASE 180-GEBIETEN

摘要

A technique in which a first boundary region is added to the ends of phase zero (0) pattern defining polygons and a second boundary region is added to the ends of phase 180 pattern. This technique can improve line end pattern definition and improve the manufacturability and patterning process window. The added boundary region balances the light on both sides of the line ends, resulting in a more predictable final resist pattern.