发明名称 NOVEL POLYIMIDE PRECURSOR COMPOSITION, USE THEREOF AND PRODUCTION METHOD THEREOF
摘要 <p>Disclosed is a polyimide precursor composition which can be cured at low temperatures (250°C or less), while having low viscosity even at high concentration. Also disclosed is a method for producing such a polyimide precursor composition. Further disclosed are a polyimide coating film obtained from such a polyimide precursor composition and having good physical properties, a method for producing such a polyimide coating film, a photosensitive resin composition using such a polyimide precursor composition, and a method for producing such a photosensitive resin composition. The polyimide precursor composition is characterized by containing an imidized tetracarboxylic acid having a specific structure and a diamine having a specific structure.</p>
申请公布号 WO2008078620(A1) 申请公布日期 2008.07.03
申请号 WO2007JP74392 申请日期 2007.12.19
申请人 KANEKA CORPORATION;FUJIHARA, KAN;KOGISO, TETSUYA;SEKITO, YOSHIHIDE 发明人 FUJIHARA, KAN;KOGISO, TETSUYA;SEKITO, YOSHIHIDE
分类号 C08L79/08;C08G73/10;C09D179/04;C09D179/08;G03F7/037;H05K3/28 主分类号 C08L79/08
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