| 摘要 |
An apparatus for processing a substrate and a method for manufacturing the same are provided to easily assemble a gas supplying member and to perfectly seal a flow channel formed in a gas distribution ring from the outside by using a sealing member. A lower chamber of which upper portion is opened provides a space where a process is performed. A supporting member(200) is installed in the lower chamber. The supporting member includes a supporting plate(220) on which a substrate is placed. Gas supplying members(300,600) are coupled to the upper portion of the lower chamber to supply a source gas to an upper portion of the supporting plate. The gas supplying member has a gas distribution ring and a sealing member(326). The gas distribution ring is coupled to the upper portion of the lower chamber. Flow channels(322,324) are formed on the gas distribution ring. The source gas flows through the flow channels. The flow channel is recessed from a bottom surface contacted to the lower chamber toward an upper portion. The sealing member is coupled to an entrance of the recessed part from the bottom surface to form the flow channels, which are sealed from the outside.
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