| 摘要 |
PROBLEM TO BE SOLVED: To provide a vapor deposition apparatus which can suppress the leakage of gas from a supply pipe. SOLUTION: The vapor deposition apparatus 1 includes a flow channel 4 for supplying gases G1-G3 onto the top face of a substrate 21; a susceptor 17 which holds the substrate 21 in an internal space 11 of the flow channel 4 and can be rotated; and a channel 7 extended from a space on the upstream side between the flow channel 4 and the susceptor 17 toward the downstream side. The susceptor 17 constitutes a part of the channel 7, and the channel 7 communicates with an internal space 8. COPYRIGHT: (C)2008,JPO&INPIT
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