| 摘要 |
PROBLEM TO BE SOLVED: To provide an antistatic film of a support usable for image-forming device elements and the like and having surface resistance value controlled within a specific range of a semiconductor region. SOLUTION: An antistatic film-forming composition comprising aπ-electron conjugated conductive polymer, a resin component and a solvent is produced. The antistatic film is formed on the surface by applying or spraying the composition on a support or by dipping the support in the composition and removing the solvent. At least one of polyurethanes, polyesters, acrylic resins, polyamides, epoxy resins, alkyd resins, phenol resins and polysiloxanes is used as the resin component. COPYRIGHT: (C)2008,JPO&INPIT
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