| 摘要 |
A method for forming photoelectric conversion substrate is provided. First, a conductive substrate is fixed onto a base in a vacuum chamber having a TiO<SUB>2 </SUB>target therein. After that, the vacuum chamber is heated so that the temperature therein is kept between 70~100° C. Then, a plasma gas consisting of argon and oxygen is filled into the vacuum chamber. The filling pressure of the plasma gas is in the range of 1~10 Pa and the flow ratio of argon to oxygen thereof is in the range of 9:1~7:1. Finally, an anatase TiO<SUB>2 </SUB>layer is formed on the conductive substrate by sputtering. A method for manufacturing a dye-sensitized solar cell is also disclosed in the specification.
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