发明名称 ION IMPLANTATION WITH A COLLIMATOR MAGNET AND A NEUTRAL FILTER MAGNET
摘要 <p>This disclosure describes an ion implanter having a collimator magnet that is configured to shape an ion beam. A first deceleration stage is configured to manipulate energy of the ion beam shaped by the collimator magnet. A neutral filter magnet is configured to filter neutral atoms from the ion beam passing through the first deceleration stage.</p>
申请公布号 WO2008079921(A1) 申请公布日期 2008.07.03
申请号 WO2007US88274 申请日期 2007.12.20
申请人 VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC.;BENVENISTE, VICTOR, M.;CAMPBELL, CHRISTOPHER, W.;SINCLAIR, FRANK 发明人 BENVENISTE, VICTOR, M.;CAMPBELL, CHRISTOPHER, W.;SINCLAIR, FRANK
分类号 H01J37/317;H01J37/147 主分类号 H01J37/317
代理机构 代理人
主权项
地址