ION IMPLANTATION WITH A COLLIMATOR MAGNET AND A NEUTRAL FILTER MAGNET
摘要
<p>This disclosure describes an ion implanter having a collimator magnet that is configured to shape an ion beam. A first deceleration stage is configured to manipulate energy of the ion beam shaped by the collimator magnet. A neutral filter magnet is configured to filter neutral atoms from the ion beam passing through the first deceleration stage.</p>
申请公布号
WO2008079921(A1)
申请公布日期
2008.07.03
申请号
WO2007US88274
申请日期
2007.12.20
申请人
VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC.;BENVENISTE, VICTOR, M.;CAMPBELL, CHRISTOPHER, W.;SINCLAIR, FRANK
发明人
BENVENISTE, VICTOR, M.;CAMPBELL, CHRISTOPHER, W.;SINCLAIR, FRANK