发明名称 MRAM-PRAM COMPOSITE MEMORY DEVICE AND METHOD OF MANUFACTURING THE SAME
摘要 <p>An MRAM-PRAM composite memory device and a manufacturing method thereof are provided to remarkably increase the degree of integration by implementing a multi-bit memory in one memory device. A phase change layer(22) is formed on a bottom electrode(21), and a top electrode(23) is formed on the phase change layer. A magnetoresistance structure(M) is formed on a side of the phase change layer. The magnetoresistance has a pinned layer(202), a non-magnetic layer(203) and a free layer(204) with variable magnetization direction. A first capping layer(201) is formed between the bottom electrode and a pinned layer, and a second capping layer is formed between the free layer and the top electrode.</p>
申请公布号 KR20080061765(A) 申请公布日期 2008.07.03
申请号 KR20060136837 申请日期 2006.12.28
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 NOH, JIN SEO;CHO, KYOUNG LAE
分类号 H01L27/115;G11C11/15 主分类号 H01L27/115
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