发明名称 APPARATUS FOR PRODUCING TRICHLOROSILANE
摘要 PROBLEM TO BE SOLVED: To provide an apparatus for producing trichlorosilane where, even in the case a heat element lies in a high temperature, mechanical strength is maintained, further, the generation of impurities is prevented, and further, increase in cost of members can be suppressed. SOLUTION: The apparatus comprises a reactor 1 formed of quartz, a heating mechanism 2 for heating the reactor 1, and a gas spray mechanism 3 for spraying a supply gas containing tetrachlorosilane and hydrogen against the reactor 1. Namely, even in the case the reactor 1 lies in a high temperature of 800 to 1,400°C, the invention provides high mechanical strength, and further, it can be formed at high purity. Further, the phenomenon, that the reactor 1 is reacted with gas components in a feed gas and a reaction product gas, so as to produce impurities, does not occur, and trichlorosilane with high purity can be obtained. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008150273(A) 申请公布日期 2008.07.03
申请号 JP20070249626 申请日期 2007.09.26
申请人 MITSUBISHI MATERIALS CORP 发明人 ISHII TOSHIYUKI
分类号 C01B33/107 主分类号 C01B33/107
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