发明名称 Debris mitigation system and lithographic apparatus
摘要 A debris mitigation system for trapping debris coming from a tin debris-generating radiation source is provided. The debris mitigating system includes a debris barrier comprising a plurality of foils, and a cleaning system constructed and arranged to clean the foils. The cleaning system includes a supply unit to provide a liquid alloy to the foils to dissolve and flush trapped debris from the foils. The alloy includes gallium, indium, tin, or any combination thereof.
申请公布号 US2008159471(A1) 申请公布日期 2008.07.03
申请号 US20060645808 申请日期 2006.12.27
申请人 ASML NETHERLANDS B.V. 发明人 WILHELMUS VAN HERPEN MAARTEN MARINUS JOHANNES;SOER WOUTER ANTHON
分类号 G21K5/00 主分类号 G21K5/00
代理机构 代理人
主权项
地址