发明名称 OPTICAL SEMICONDUCTOR ELEMENT AND ITS FABRICATION PROCESS
摘要 <p><P>PROBLEM TO BE SOLVED: To provide an optical semiconductor element in which an end face can be formed at a target position with good reproducibility and decline in coupling efficiency with an optical fiber can be suppressed. <P>SOLUTION: An active layer (18) is formed on a semiconductor substrate having a pair of end faces (15A, 15B) that face the opposite directions mutually. An upper clad layer (19) having a refractive index smaller than that of the active layer is formed on the active layer. A grating (25) is arranged in the upper clad layer on the opposite sides of a distribution feedback region of a waveguide region (22) having end regions (22B) defined at the opposite ends and the distribution feedback region (22A) defined internally and extending from one end face to the other end face of the semiconductor substrate. A low refractive index region (26) having a refractive index lower than that of the upper clad layer is arranged in the upper clad layer on each side of the end region of the waveguide region. <P>COPYRIGHT: (C)2008,JPO&INPIT</p>
申请公布号 JP2008153260(A) 申请公布日期 2008.07.03
申请号 JP20060336800 申请日期 2006.12.14
申请人 FUJITSU LTD;UNIV OF TOKYO 发明人 HATORI NOBUAKI;YAMAMOTO TAKAYUKI;ARAKAWA YASUHIKO
分类号 H01S5/12;H01S5/223 主分类号 H01S5/12
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