发明名称 REACTIVE SPUTTER DEPOSITION OF A TRANSPARENT CONDUCTIVE FILM
摘要 <p>Methods for sputter depositing a transparent conductive oxide (TCO) layer are provided in the present invention. The transparent conductive oxide layer may be utilized as a back reflector in a photovoltaic device. In one embodiment, the method includes providing a substrate in a processing chamber, forming a first portion of a transparent conductive oxide layer on the substrate by a first sputter deposition step, and forming a second portion of the transparent conductive oxide layer by a second sputter deposition step.</p>
申请公布号 WO2008079837(A1) 申请公布日期 2008.07.03
申请号 WO2007US88035 申请日期 2007.12.19
申请人 APPLIED MATERIALS, INC.;LI, YANPING;YE, YAN;CHAE, YONG-KEE;WON, TAE KYUNG;KADAM, ANKUR;SHENG, SHURAN;LI, LIWEI 发明人 LI, YANPING;YE, YAN;CHAE, YONG-KEE;WON, TAE KYUNG;KADAM, ANKUR;SHENG, SHURAN;LI, LIWEI
分类号 C23C14/00 主分类号 C23C14/00
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