| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an array substrate, a display device and a method for manufacturing the substrate, which contribute to reduction in cost, increase in yield and expansion of the process margin of forming and processing an intermediate resist film thickness by reducing variation in the intermediate resist film thickness when intermediate exposure is performed on a region where a plurality of types of thin film patterns are formed at the same photo lithography step. <P>SOLUTION: An array substrate 100 has regions H1, H2, H3 in which an intermediate resist film thickness is formed and processed by an intermediate exposure amount which does not completely expose a resist 30, respectively on a drain electrode 8, source terminal 62 and a common connection wiring 46 which are made of a second conducive film. Thin film patterns 12, 15 or a common wiring 3 made of a first conductive film is formed in substantially entire regions on the bottom layers of the regions H1, H2, H3 so that the heights from a substrate 1 may be substantially the same. <P>COPYRIGHT: (C)2008,JPO&INPIT |
