发明名称 STAGE DEVICE, CONTROL SYSTEM, EXPOSURE SYSTEM AND DEVICE MANUFACTURING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To improve the measurement precision of the interferometer for measuring the mobile body. <P>SOLUTION: A stage device 101 is provided with an X-axis laser interferometer 2 and a Y-axis laser interferometer 3 for measuring the position and attitude of a stage 10 and a wavelength compensator 1 for compensating the variation of the wavelength of the X-axis laser interferometer 2 and a Y-axis interferometer 3, wind ducts 14x and 14y connected with a temperature regulator 12 for feeding the temperature controlled air to the light axes of the X-axis laser interferometer 2 and the Y-axis laser interferometer 3, and the wind duct 14c connected with the temperature controller 12 for feeding the temperature controlled air to the wavelength compensator 1. Thereby, the time for transmitting the temperature controlled air from the temperature controller 12 through the wind ducts 14x and 14y to the light axes of the X-axis laser interferometer 2 and the Y-axis laser interferometer 3 are same as the time for transmitting the temperature controlled air from the temperature controller 12 to the wavelength compensator 1 through the wind duct 14c. <P>COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008151542(A) 申请公布日期 2008.07.03
申请号 JP20060337579 申请日期 2006.12.14
申请人 CANON INC 发明人 TANAKA TAKATOSHI
分类号 G01B11/00;G01B9/02;G12B5/00;H01L21/027;H01L21/68 主分类号 G01B11/00
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