| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a measuring device that improves the measuring accuracy and achieves high precision measurement of the optical performance (wave surface aberration) of a lighting system to be inspected. <P>SOLUTION: The measuring device includes an object surface side measuring pattern having an object surface side slit which is disposed at an object surface side of the lighting system to be inspected and whose long length direction is parallel to a first direction and whose width in a short length direction is equal to the diffraction limit of the lighting system to be inspected or below thereof, a first image surface side slit which is disposed at an image surface side of the lighting system to be inspected and whose long length direction is parallel to the first direction and whose width in the short length direction is equal to the diffraction limit or below thereof, and an image surface side measuring pattern having a second image surface side slit whose long length direction is parallel to the first direction and whose width in the short length direction is greater than the diffraction limit of the lighting system to be inspected. Further, the device includes a lighting system to light the object surface side measuring pattern using a plane polarization that oscillates in a direction parallel to the first direction, and a detector to detect interference patterns generated by light emitted from the first and second image surface side slits. <P>COPYRIGHT: (C)2008,JPO&INPIT |
