MANUFACTURING METHOD FOR NANOSTRUCTURED PATTERN

摘要

PROBLEM TO BE SOLVED: To provide a method of forming a nanostructured pattern on a substrate. SOLUTION: The steps include a step of supplying a substrate and a step of coating the substrate with a functional material to form a layer of the functional material. A block copolymer of at least an A polymer chain and a B polymer chain coats the functional material to form a layer. The block copolymer is dried to form orderly nanodomains. The A polymer chain of the dried block copolymer is removed to form voids, and the functional material is then removed from where the A polymer chain has been removed. COPYRIGHT: (C)2008,JPO&INPIT