Field illumination system for microlithographic projection exposure system, has illumination angle variation device influencing intensity and/or phase of light so that intensity contribution of raster units to total intensity is varied

摘要

The system (5) has a raster arrangement (12) with units for generating a raster arrangement of secondary light sources. An illumination angle variation device (14) with additional optical action influences the intensity and/or phase and/or beam direction of illumination light so that an intensity contribution of raster units to the total illumination intensity varies over the illumination field (3). Independent claims are also included for the following: (1) a method for manufacturing micro-structured components (2) a micro-structured component, which is manufactured using a microlithographic process.