发明名称 Defect e.g. turbidity, testing device for use during manufacturing of semiconductor device, has photo detector detecting light scattered from test target surface, where surface is formed in non-structured area
摘要 <p>The device has a light source lighting a test target surface with a test light, where the surface has a pellicle (P1), a structured area (Sx), in which a structure is formed, and a non-structured area (Sy), in which no structure is formed. The pellicle suspends or supports a thin layer (P2) to prevent adhesion of external materials on the structured area provided in the non-structured area. A photo detector detects the light that is broken, diffracted, deflected and/or scattered from the surface when a light scanning device scans the light. The surface is formed in the non-structured area.</p>
申请公布号 DE102007062020(A1) 申请公布日期 2008.07.03
申请号 DE20071062020 申请日期 2007.12.21
申请人 HORIBA LTD. 发明人 KANZAKI, TOYOKI;OHKA, TATSUO;IKEDA, TERUHIKO
分类号 G01N21/956;G06K9/52 主分类号 G01N21/956
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