| 摘要 |
PROBLEM TO BE SOLVED: To provide a metal vapor deposition film which has an enough security function, reduces an influence on adjacent divided parts, and copes with optional film resistance. SOLUTION: The metal vapor deposition film with a metal vapor-deposited on at least one side of a film substrate includes on the metal vapor deposition surface, at least one non-vapor deposition margin 1 continuing in the longitudinal direction and a plurality of non-vapor deposition margins 2 in the width direction which meet the following items (1)-(4): (1) each non-vapor deposition margin 2 has at least one discontinuous part, (2) each non-vapor deposition margin does not cross, (3) there is at least one narrow part 4 in the width direction between adjacent non-vapor deposition margins, (4) when the membrane resistance of the active part of the metal vapor deposition surface is R and the width of the narrow part is D, the width of the narrow part D falls within a range of 0.07×R<SP>0.83</SP>-0.17×R<SP>0.83</SP>. COPYRIGHT: (C)2008,JPO&INPIT
|
